Texture and Stress Evolution in HfN Films Sputter-Deposited at Oblique Angles

A theoretical model for the electrical properties of chromium thin films sputter deposited at oblique incidence

Theoretical and experimental characterization of TiO2 thin films deposited at oblique angles

The microstructural features of amorphous TiO2 thin films grown by the electron beam physical vapour deposition technique at oblique angles have been experimentally and theoretically studied. The microstructural features of the deposited films were characterized by considering both, the column tilt angle and the increase of the column thickness with height. A Monte Carlo model of the film growt...

Nanocolumnar growth of thin films deposited at oblique angles: beyond the tangent rule Running title: Nanocolumnar growth at oblique angles Running Authors: Alvarez et al

Rafael Alvarez, Carmen Lopez-Santos, Julian Parra-Barranco, Victor Rico and Angel Barranco Instituto de Ciencia de Materiales de Sevilla (CSIC-US), c/Americo Vespucio 49, 41092 Seville, Spain Jose Cotrino Instituto de Ciencia de Materiales de Sevilla (CSIC-US), c/Americo Vespucio 49, 41092 Seville, Spain and Departamento de Física Atómica, Molecular y Nuclear (Universidad de Sevilla). Av. Reina...

Enhanced methanol sensing performance of oblique deposited WO3 thin films

Methanol (CH3OH) is a colorless liquid with a mild odor. The wide ranges of applications, toxicity and clinical implications of methanol have made necessary to develop reliable and high-performance methanol sensors. In this paper, WO3 thin films were deposited on SiO2/Si substrates by e-beam evaporation technique under normal and oblique angles and then post-annealed at 500 °C with a flow of ox...

Physical Properties of Reactively Sputter-Deposited C-N Thin Films

This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...